Reduction of hydrogen induced losses in PECVD - SiO , N , optical waveguides in the near infrared
نویسنده
چکیده
Introduction Silicon oxynitride is a flexible material for use as planar optical waveguides because by changing the composition ( O N ratio) the refractive index can be tuned from 1.46 to 2.0'. Several methods can be used for deposition: PECVD, LPCVD and sputtering. The advantages of PECVD are easy control of composition, high deposition rate and low stress. A disadvantage is the high hydrogen content, up to 30 at%. Absorption bands from Si-OH and N-H at resp. 1380 nm and 1510 nm have to be reduced for telecommunication applications ' . It is known that the amount of hydrogen can be reduced by annealing, but this complicated process depends strongly on the deposition conditions '.
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